Snowflake cleaning machine,Also known as dry ice cleaning machine,It is a type based on carbon dioxide(CO₂)Cleaning equipment。It uses high pressure to convert liquid carbon dioxide into tiny snowflake particles,And clean the wafer surface through the high-speed impact force of these particles。This cleaning method combines the dual effects of physical impact and chemical dissolution,Can efficiently remove grease from the surface of wafers、granule、Chemical substances and other pollutants。

When-78After the dry ice particles in Celsius come into contact with the surface of the wafer,Will cause embrittlement and explosion phenomenon,Shrink and loosen dirt。subsequently,Dry ice pellets will instantly vaporize and expand800times,Generate strong peeling force,Quickly remove dirt、Completely detach from the wafer surface。The entire process is both fast and efficient,At the same time, it avoids the surface damage that may be caused by traditional cleaning methods。

Snowflake cleaning machineAdvantages of

Efficient cleaning:The high-speed impact and low-temperature effect of snowflake particles,Capable of quickly and thoroughly removing contaminants from the wafer surface,Significantly improve cleaning efficiency。This efficient cleaning capability not only improves the quality of the chip,It also reduces the defect rate caused by pollutants,Thereby improving production efficiency and yield rate。

Environmentally friendly and pollution-free:Snowflake cleaning machineThe cleaning medium used is liquid carbon dioxide,No harmful waste liquid or exhaust gas will be generated during the cleaning process,No pollution to the environment。meanwhile,Carbon dioxide can be recycled and reused,Reduced energy consumption and operating costs。This environmental characteristic meets the requirements of modern industry for sustainable development,Reduced the environmental pressure on enterprises。

Non destructive cleaning:Due to the use of non-contact cleaning method,The snowflake cleaning machine avoids the potential damage to the wafer surface caused by mechanical friction,Ensured the integrity and flatness of the wafer。This is of great significance for improving the production efficiency and yield of chips。

Highly automated:Snowflake cleaning machineHighly integrated with modern semiconductor production lines,Realize automated cleaning,Improved production efficiency and stability。By introducing advanced sensors and control systems,Real time monitoring and precise control of the cleaning process,Further improved cleaning efficiency and consistency。

Snowflake cleaning machineApplication in wafer manufacturing

During the wafer manufacturing process,Cutting from silicon wafers、Polishing to photolithography、Etching and other various processes,Strict cleaning treatment is required for the surface of the wafer。Snowflake cleaning machine relies on its precise control ability and efficient cleaning effect,Plays an important role in these links。

Silicon wafer pretreatment:After silicon wafer cutting and polishing,Using a snowflake cleaning machine can quickly remove residual abrasive materials from the surface,Provide a clean foundation for subsequent processes。

Pre lithography cleaning:Before the photolithography process,The surface of the wafer must be kept absolutely clean,To avoid pattern distortion or defects。Snowflake cleaning machine can thoroughly remove surface pollutants,Ensure the accuracy and quality of photolithography patterns。

Cleaning after etching:During the etching process, a large amount of by-products and residues will be generated,If these pollutants are not removed in a timely manner,It will seriously affect the subsequent process。The snowflake cleaning machine can deeply etch the inside of the groove,Thoroughly remove residues,Restore the cleanliness of the wafer surface。