Snowflake cleaning machineWorking principle of

Snowflake cleaning machine,Also known as dry ice cleaning machine,It is a type based on carbon dioxide(CO₂)Cleaning equipment。It uses high pressure to convert liquid carbon dioxide into tiny snowflake particles,When these particles collide with the surface of the chip at high speed,Capable of generating strong physical impact force,Effectively remove various pollutants from the surface,Like particles、organic compound、Metal ions, etc。When-78After the dry ice particles in Celsius come into contact with the dirt surface,Will cause embrittlement and explosion phenomenon,Shrink and loosen dirt。subsequently,Dry ice pellets will instantly vaporize and expand800times,Generate strong peeling force,Quickly remove dirt、Completely detach from the surface of an object,Thus achieving high efficiency、security、Energy saving cleaning effect。

Snowflake cleaning machineThe role in chip manufacturing

Ensure the quality of chip packaging:Before chip packaging,Need to clean the chip,To ensure that there is no contamination or defects during the packaging process,Ensure the quality of the packaged chip。Snowflake cleaning machineWith its efficient cleaning capability and precise control system,Capable of completing a large amount of chip cleaning work in a short period of time,Improve production efficiency and yield rate。

Realize chip recycling and reuse:In the process of chip recycling and reuse,Snowflake cleaning machineCan efficiently remove metal from the surface of chips、Impurities such as oxides,Realize the recycling and reuse of chips,lower production cost。

Ensure the accuracy of photolithography patterns:Before the photolithography process,The surface of the chip must be kept absolutely clean,To avoid pattern distortion or defects。Snowflake cleaning machineCan thoroughly remove surface pollutants,Ensure the accuracy and quality of photolithography patterns。

Protecting fragile chip structures:Snowflake cleaning machineThe non-contact cleaning method avoids the friction that may occur in traditional cleaning methods、Workpiece damage caused by scratching, etc,Further ensuring the integrity and performance stability of the product。

Snowflake cleaning machineAdvantages of

High precision cleaning capability:Snowflake cleaning machineThe snowflake particles are extremely small in size,Capable of penetrating into the tiny gaps and depressions on the surface of the wafer,Thoroughly remove pollutants at the micrometer or even nanometer level,Like particles、organic compound、Metal ions, etc。This high-precision cleaning capability,Provided reliable assurance for semiconductor manufacturing processes。

Environmentally friendly and pollution-free:Snowflake cleaning machineThe cleaning medium used is liquid carbon dioxide,No harmful waste liquid or exhaust gas will be generated during the cleaning process,No pollution to the environment。meanwhile,The cleaned carbon dioxide can be recycled through a recovery system for reuse,Reduced operating costs,Sustainable utilization of resources has been achieved。

Avoid surface damage:Due to the use of non-contact cleaning method,Snowflake cleaning machineWhile removing pollutants,Avoiding mechanical damage and chemical corrosion to the surface of wafers or other semiconductor materials。This is particularly important for fragile chips and precise packaging structures in semiconductor manufacturing,Ensure the integrity and reliability of the product。

Efficient automation:Snowflake cleaning machineUsually highly integrated with modern semiconductor production lines,Realize automated cleaning。Through precise control systems and efficient cleaning processes,Capable of completing a large amount of wafer cleaning work in a short period of time,Improve production efficiency and yield rate。