Snowflake cleaning faces the biggest challenge for semiconductors

Release time:2024-08-21 11:16:54 Classification:【Industry dynamics】

Snowflake cleaning,As an efficient、Environmentally friendly and non-destructive cleaning technology,Gradually becoming an important choice in the clean field of the semiconductor industry,But at the same time, it also faces unprecedented challenges。

Snowflake cleaningPrinciples and advantages of technology

Snowflake cleaning,seeing the name of a thing one thinks of its function,It utilizes carbon dioxide(CO₂)A technique for cleaning the characteristics of。By pressurizing liquid carbon dioxide and releasing it at the solid-liquid critical point,Form snowflake shaped dry ice particles,When these particles come into contact with the surface of the workpiece,Will quickly freeze surface dirt,And through the volume expansion generated by sublimation, the dirt is blasted open,Ultimately achieving the purpose of cleaning。Compared to traditional cleaning methods,Snow cleaning has many advantages:

Efficient cleaning:Snowflake cleaningAdopting high-pressure injection method,Being able to quickly、Thoroughly remove the grease on the surface of the chip、Particles and chemicals,Ensure high cleanliness of the chip surface。

Environmental protection and energy conservation:Using solid carbon dioxide as a cleaning medium,The entire cleaning process is free of chemical pollution,And carbon dioxide gas can be recycled and reused,Meet the requirements of environmental protection and sustainable development。

Safe and reliable:Snowflake cleaningThe low-temperature effect avoids mechanical or chemical damage that may occur in traditional cleaning methods,Highly protective for chip samples and precision components。

Multifunctionality:Snowflake cleaningThe technology is suitable for cleaning multiple materials,From plastic parts to metal components,From electronic components to medical devices,Widely used in various fields。

The Clean Challenge in the Semiconductor Industry

althoughSnowflake cleaningTechnology has shown great potential in the field of semiconductor cleaning,But it still faces many challenges,Especially when facing high requirements in the semiconductor manufacturing process。

1. Accuracy and cleanliness requirements

Every step in the semiconductor manufacturing process requires extremely high precision and cleanliness。Any tiny particles or contaminants on the surface of a chip may affect its electrical performance、Reliability and yield rate。Snowflake cleaningTechnology needs continuous optimization,To meet increasingly stringent cleaning standards。

2. Adaptability to complex process environments

Semiconductor manufacturing involves photolithography、Etching、Multiple complex process steps such as sedimentation,Each step has different requirements for cleanliness。Snowflake cleaningTechnology needs to adapt to the requirements of different process stages,Ensure optimal cleaning performance at every stage。

3. Cost control and efficiency improvement

The cleaning cost in the semiconductor manufacturing process accounts for a considerable proportion。How to ensure cleanliness quality while,Reduce cleaning costs、Improve cleaning efficiency,yesSnowflake cleaningImportant issues that technology needs to face。

Strategies for Dealing with Challenges

1. Technological Innovation and Optimization

Continuous technological innovation and optimization are key to improvementSnowflake cleaningThe key to the application effect of technology in the semiconductor field。By improving equipment design、Optimize cleaning process parameters and other means,Improve cleaning efficiency and cleanliness,Simultaneously reducing costs。

2. Strengthen cooperation with the semiconductor industry

Establish close cooperative relationships with semiconductor manufacturing enterprises,Gain a deeper understanding of their cleaning needs and technical challenges,Jointly develop materials suitable for semiconductor manufacturingSnowflake cleaningSolution。Through industry university research cooperation,Promote the widespread application of snowflake cleaning technology in the semiconductor field。

3. Environmental Protection and Sustainable Development

Pushing forwardSnowflake cleaningAt the same time as technological development,Pay attention to environmental protection and sustainable development。Strengthen the research on the recovery and reuse technology of carbon dioxide gas,Reduce the impact on the environment。meanwhile,Actively promote the concept of green production,Assist the semiconductor industry in achieving green transformation。